Mechanical Properties and Residue Stress of Four Kinds of ZrC Coatings Prepared by Chemical Vapor Deposition

doi:10.1007/s12204-012-1350-5

摘要/Abstract

摘要： Four kinds of ZrC coatings with nearly the same thickness have been successfully prepared on graphite substrate by chemical vapor deposition (CVD) through controlling the ratio of inlet reacting gases. From backscattered electron images, it can be inferred that ZrCIII coating has the best tightness of all coatings. Meanwhile, line energy spectrum curve shows that zirconium and carbon elements distribute uniformly along the normal direction of the ZrCIII coating. As for varied microstructures, the coatings show different mechanical properties and residue stress. The strength and elastic modulus of ZrCIII coating were up to 89.57 and 1 192.5GPa, respectively. Those make it near the level of diamond. Value of residue tensile stress of ZrC+C composite coating was only 7.729MPa and that of ZrCIII coatings was 349.632 MPa. The strong combination of small-size grains in ZrCIII coating plays a decisive role to the best mechanical properties. However, strong misfit of lattice between ZrCIII coating and substrate can induce high residue stress.

关键词: zirconium carbide, coating, chemical vapor deposition (CVD), microstructure

Abstract: Four kinds of ZrC coatings with nearly the same thickness have been successfully prepared on graphite substrate by chemical vapor deposition (CVD) through controlling the ratio of inlet reacting gases. From backscattered electron images, it can be inferred that ZrCIII coating has the best tightness of all coatings. Meanwhile, line energy spectrum curve shows that zirconium and carbon elements distribute uniformly along the normal direction of the ZrCIII coating. As for varied microstructures, the coatings show different mechanical properties and residue stress. The strength and elastic modulus of ZrCIII coating were up to 89.57 and 1 192.5GPa, respectively. Those make it near the level of diamond. Value of residue tensile stress of ZrC+C composite coating was only 7.729MPa and that of ZrCIII coatings was 349.632 MPa. The strong combination of small-size grains in ZrCIII coating plays a decisive role to the best mechanical properties. However, strong misfit of lattice between ZrCIII coating and substrate can induce high residue stress.

Key words: zirconium carbide, coating, chemical vapor deposition (CVD), microstructure

中图分类号:

TQ 134.1

SUN Weia* (孙威), XIONG Xianga (熊翔), LI Xiao-binb (李小斌), LI Guo-donga (李国栋). Mechanical Properties and Residue Stress of Four Kinds of ZrC Coatings Prepared by Chemical Vapor Deposition[J]. 上海交通大学学报（英文版）, 2012, 17(6): 706-711.

SUN Weia* (孙威), XIONG Xianga (熊翔), LI Xiao-binb (李小斌), LI Guo-donga (李国栋). Mechanical Properties and Residue Stress of Four Kinds of ZrC Coatings Prepared by Chemical Vapor Deposition[J]. Journal of shanghai Jiaotong University (Science), 2012, 17(6): 706-711.

参考文献

[1] Craciun V, Woo J, Craciun D, et al. Epitaxial ZrC thin films grown by pulsed laser deposition [J]. Applied Surface Science, 2006, 252: 4615-4618.
[2] Zhu Jun-guo, Du Chun-biao, Zhang Bing-zhong, et al. Chemical vapor deposition of zirconium carbide coating [J]. Journal of Tsinghua University, 2000, 40(12): 59-62 (in Chinese).
[3] William A M, Paul R D. Single-crystal zirconium carbide as a high-temperature thermionic cathode material [J]. IEEE Transactions of Electron Devices, 1989, 36(1): 220-224.
[4] Wang Y G, Liu Q M, Liu J L, et al. Deposition mechanism for chemical vapor deposition of zirconium carbide coatings [J]. Journal of American Ceramic Society, 2008, 91(4): 1249-1952.
[5] Jong H P, Choong H J, Do J K, et al. Effect of H2 dilution gas on the growth of ZrC during low pressure chemical vapor deposition in the ZrCl4-CH4-Ar system [J]. Surface & Coatings Technology, 2008, 203: 87-90.
[6] Aihara J, Ueta S H, Yasuda A, et al. TEM/STEM observation of ZrC coating layer for advanced hightemperature gas-cooled reactor fuel [J]. Journal of American Ceramic Society, 2009, 92(1): 197-203.
[7] Won Y S, Varanasi V G, Kryliouk O, et al. Equilibium analysis of zirconium carbide CVD growth [J]. Journal of Crystal Growth, 2007, 307: 302-308.
[8] Won Y S, Kim Y S, Varanasi V G, et al. Growth of ZrC thin films by aerosol-assisted MOCVD [J]. Journal of Crystal Growth, 2007, 304: 324-332.
[9] Stinton D P, Besmann T M, Lowden R A, et al. Advanced ceramics by chemical vapor deposition techniques [J]. Ceramic Bulletin, 1988, 67(2): 350-355.
[10] Sun W, Xiong X, Huang B Y, et al. Preparation of ZrC nano-particles reinforced amorphous carbon composite coating by atmospheric pressure chemical vapor deposition [J]. Applied Surface Science, 2009, 255: 7142-7146.
[11] Sun W, Xiong X, Huang B Y, et al. ZrC ablation protective coating for carbon/carbon composites [J]. Carbon, 2009, 47: 3365-3380.
[12] Sun W, Xiong X, Huang B Y, et al. Microstructural control of zirconium carbide coating prepared by chemical vapor deposition [J]. ESC Transactions, 2009, 25(8): 291-299.
[13] Lesage J, Pertuz A, Puchi E S, et al. A mode to determine the surface hardness of thin films from standard micro-indentation tests [J]. Thin Solid Films, 2006, 497: 232-238.
[14] Dall A G, Verdier M, Huck H, et al. Nanoindentation on carbon thin films obtained from a C60 ion beam [J]. Applied Surface Science, 2006, 252: 8005-8009.
[15] Feng W R, Yan D R, He J N, et al. Microhardness and toughness of the TiN coating prepared by reactive plasma spraying [J]. Applied Surface Science, 2005, 243: 204-213.
[16] Cullity B D. Elements of X-ray diffraction [M]. London: Addison-Wesley, 1978.
[17] Donald R A. The science and engineering of materials [M]. Stamford, Connecticut, USA: Thomson Learning, 2003.
[18] Pierson H B. Handbook of chemical vapor deposition [M]. Park Ridge, NJ: Noyes Publications, 1992.