Synergy Effect of Nonionic Surfactant and Ultrasonic on the 
Post-Cleaning of Aluminium Alloy Chemical Mechanical Polishing

doi:10.16183/j.cnki.jsjtu.2018.05.012

Abstract

Abstract: This paper studied two cleaning methods comprising of dipping and ultrasonic for 7003 aluminium alloy after chemical mechanical polishing (CMP). A series of experiments were carried out to investigate the effect of octyl phenyl polyoxyethylene ether (TX-100) on the removal of SiO2 particles in post CMP cleaning process of Al alloy. The surface morphology and roughness after cleaning were characterized by atomic force microscope (AFM). It was found that the increase in TX-100 concentration leads to the initially decrease in abrasive particle diameter, Zeta potential and contact angle, followed by an increase trend with the further increase in TX-100 concentration. Combining with ultrasonic and TX-100, the removal ratio of SiO2 particles could be enhanced from 57% to 90%, and the surface roughness decreases to 2.16 nm after cleaning.

Key words: aluminium alloy, chemical mechanical polishing (CMP), cleaning, ultrasonic

CLC Number:

TG 175

WANG Yongguang1, WU Zhonghua2,ZHAO Yongwu2,CHEN Yao1,LIU Ping2,LU Xiaolong1,ZHU Yuguang1. Synergy Effect of Nonionic Surfactant and Ultrasonic on the Post-Cleaning of Aluminium Alloy Chemical Mechanical Polishing[J]. Journal of Shanghai Jiaotong University, 2018, 52(5): 582-586.

References

［1］WEI K H, HUNG C C, WANG Y S, et al. Cleaning methodology of small residue defect with surfactant in copper chemical mechanical polishing post-cleaning［J］. Thin Solid Films, 2016, 618: 77-80. ［2］SHIN W K, AN J H, JEONG H D. Investigation of particle adhesion force for green nanotechnology in post-CMP cleaning［J］. International Journal of Precision Engineering and Manufacturing, 2012, 13(7): 1125-1130. ［3］LUAN X D, LIU Y L, ZHANG B G, et al. Investigation of the barrier slurry with better defect performance and facilitating post-CMP cleaning［J］. Microelectronic Engineering, 2017, 170: 21-28. ［4］HONG J, NIU X H, LIU Y L, et al. Effect of a novel chelating agent on defect removal during post-CMP cleaning［J］. Applied Surface Science, 2016, 378: 239-244. ［5］ITANO M, KERN F W J, MIYASHITA M, et al. Particle removal from silicon wafer surface in wet cleaning process［J］. IEEE Transactions on Semiconductor Manufacturing, 1993, 6(3): 258-267. ［6］曹宝成, 于新好, 马瑾, 等. 用含表面活性剂和螯合剂的清洗液清洗硅片的研究［J］. 半导体学报, 2001, 22(9): 1226-1229. CAO Baocheng, YU Xinhao, MA Jin, et al. Study of silicon wafer cleaning effects using clean solutions containing surfactants and chelates［J］. Chinese Journal of Semiconductors, 2001, 22(9): 1226-1229. ［7］WANG Y G, CHEN Y, ZHAO Y W. Chemical mechanical planarization of silicon wafers at natural pH for green manufacturing［J］. International Journal of Precision Engineering and Manufacturing, 2015, 16(9): 2049-2054. ［8］QIN K, LI Y. Mechanisms of particle removal from silicon wafer surface in wet chemical cleaning process［J］. Journal of Colloid and Interface Science, 2003, 261(2): 569-574. ［9］BUSNAINA A A, LIN H, MOUMEN N, et al. Particle adhesion and removal mechanisms in post-CMP cleaning processes［J］. IEEE Transactions on Semiconductor Manufacturing, 2002, 15(4): 374-382. ［10］史霄, 郭春华, 杨师, 等. CMP设备兆声清洗原理及应用［J］. 电子工业专用设备, 2015, 44(11): 32-35. SHI Xiao, GUO Chunhua, YANG Shi, et al. The megasonic cleaning theory and its application in the post CMP cleaning［J］. Equipment for Electronic Products Manufacturing, 2015, 44(11): 32-35. ［11］CHEREPY N J, SHEN T H, ESPOSITO A P, et al. Characterization of an effective cleaning procedure for aluminum alloys: Surface enhanced Raman spectroscopy and zeta potential analysis［J］. Journal of Colloid and Interface Science, 2005, 282(1): 80-86.

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Synergy Effect of Nonionic Surfactant and Ultrasonic on the Post-Cleaning of Aluminium Alloy Chemical Mechanical Polishing

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