上海交通大学学报(自然版) ›› 2018, Vol. 52 ›› Issue (5): 582-586.doi: 10.16183/j.cnki.jsjtu.2018.05.012

• 学报(中文) • 上一篇    下一篇

超声波协同作用下非离子表面活性剂 对铝合金抛光后清洗的影响

王永光1,吴中华2,赵永武2,陈瑶1,刘萍2,陆小龙1,朱玉广1   

  1. 1. 苏州大学 机电工程学院, 江苏 苏州 215021; 2. 江南大学 机械工程学院, 江苏 无锡 214122
  • 出版日期:2018-05-28 发布日期:2018-05-28
  • 基金资助:
    国家自然科学基金项目(51775360,51005102),清华大学摩擦学国家重点实验室开放基金项目(SKLTKF10B04),教育部留学回国人员启动基金项目(20111139)

Synergy Effect of Nonionic Surfactant and Ultrasonic on the Post-Cleaning of Aluminium Alloy Chemical Mechanical Polishing

WANG Yongguang1, WU Zhonghua2,ZHAO Yongwu2,CHEN Yao1,LIU Ping2,LU Xiaolong1,ZHU Yuguang1   

  1. 1. School of Mechanical and Electric Engineering, Soochow University, Suzhou 215021, Jiangsu, China; 2. School of Mechanical Engineering, Jiangnan University, Wuxi 214122, Jiangsu, China
  • Online:2018-05-28 Published:2018-05-28

摘要: 利用静态浸泡清洗和超声波辅助清洗方法,使用非离子表面活性剂辛基苯基聚氧乙烯醚(TX-100)溶液对经过化学机械抛光(浸泡SiO2抛光液)后的7003铝合金试样进行浸泡清洗,利用原子力显微镜观测试样表面的清洗效果,并计算清洗后铝合金的表面粗糙度;通过对比去离子水与TX-100溶液在铝合金表面的接触角,分析了非离子表面活性剂TX-100对铝合金化学机械抛光后清洗中SiO2颗粒的分散性、Zeta电位、表面润湿性及去除率的影响,以及TX-100与超声波协同作用的清洗机制.结果表明:随着TX-100质量分数增加,SiO2的颗粒粒径和Zeta电位均先减小而后增大;当TX-100质量分数为2.0%时,SiO2颗粒的分散性最佳;表面活性剂TX-100能够提高铝合金表面的亲水性;在铝合金的清洗过程中,由于超声波与TX-100的协同作用而使得SiO2颗粒去除率由57%提高到90%,且未出现腐蚀现象;清洗后铝合金的表面粗糙度为2.16 nm.

关键词: 铝合金, 化学机械抛光, 清洗, 超声波

Abstract: This paper studied two cleaning methods comprising of dipping and ultrasonic for 7003 aluminium alloy after chemical mechanical polishing (CMP). A series of experiments were carried out to investigate the effect of octyl phenyl polyoxyethylene ether (TX-100) on the removal of SiO2 particles in post CMP cleaning process of Al alloy. The surface morphology and roughness after cleaning were characterized by atomic force microscope (AFM). It was found that the increase in TX-100 concentration leads to the initially decrease in abrasive particle diameter, Zeta potential and contact angle, followed by an increase trend with the further increase in TX-100 concentration. Combining with ultrasonic and TX-100, the removal ratio of SiO2 particles could be enhanced from 57% to 90%, and the surface roughness decreases to 2.16 nm after cleaning.

Key words: aluminium alloy, chemical mechanical polishing (CMP), cleaning, ultrasonic

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