Abstract: The photoresist filling process was simulated by using the finite element software in the UV nanoimprint processing. According to the photoresist’s characteristics of small coefficient, a viscous fluid model which is based on fluid—solid—interaction (FSI) method through ALE (Arbitrary Lagrange Euler) algorithm was established in this simulation. The elements which affect the photoresist filling process were analyzed systematically, such as the periodic of the template, the fill factor, the aspect ratio and the nonperiodic structure template. The result shows that, comparing with the nonperiodic structure template, the periodic template will bring less deficiency. The change of the fill factor and the aspect ratio at the lower periodic template enjoys bigger effect than the larger one. The nanoimprint experiments were carried and the results match well with the simulation, which indicates the simulation’s reliability and can be used as basis for template design and surface treatment process.

Key words: UV(ultra violet) nano-imprint, finite element simulation, fill factor, periodic structure, arbitrary Lagrange Euler