Tribological properties of chemical vapor deposition (CVD) diamond films greatly affect its application
in the mechanical field. In this paper, a novel multilayer structure is proposed, with which multilayer diamond films
are deposited on silicon carbide by hot filament CVD (HFCVD) method. The different micrometric diamond grains
are produced by adjusting deposition parameters. The as-deposited multilayer diamond films are characterized by
scanning electron microscope (SEM) and white-light interferometry. The friction tests performed on a reciprocating
ball-on-plate tribometer suggest that silicon carbide presents the friction coefficient of 0.400 for dry sliding against
silicon nitride (Si3N4) ceramic counterface. With the water lubrication, the corresponding friction coefficients of
silicon carbide and as-deposited multilayer diamond films further reduce to 0.193 and 0.051, respectively. The
worn surfaces indicate that multilayer diamond films exhibit considerably high wear resistance.
CHEN Nai-chao (陈乃超), SUN Fang-hong* (孙方宏)
. Friction and Wear Performances of Hot Filament Chemical Vapor Deposition Multilayer Diamond Films Coated on Silicon Carbide Under Water Lubrication[J]. Journal of Shanghai Jiaotong University(Science), 2013
, 18(2)
: 237
-242
.
DOI: 10.1007/s12204-013-1388-z
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