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主管：中华人民共和国教育部
主办：上海交通大学
ISSN 1006-2467 CN 31-1466/U
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Journal of Shanghai Jiao Tong University
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中文
Growth Rates of HFCVD Diamond Films on Silicon Carbide Substrates for Heat Dissipation Applications
LI Weihan, QIAO Yu, SHU Da, WANG Xinchang
Journal of Shanghai Jiao Tong University . 2023, (
8
): 1078 -1085 . DOI: 10.16183/j.cnki.jsjtu.2022.043
