Preparation of Glow Discharge Tantalum Coating and Its Ablation Properties

Expand
  • 1. Mechanical and Electrical Engineering School, Sanjiang University, Nanjing 210012, China; 2. School of Material Science and Engineering, Nanjing University of Science and Technology, Nanjing 210094, China

Online published: 2018-07-28

Abstract

In order to study the effect of Ta layer on the corrosion resistance of the alloy surface, the diffused layer was prepared on the 34CrNi3Mo steel surface by double glow plasma infiltration. The surface morphology, phase structure, element distribution, hardness change and the adhesion between the infiltrated layer and the substrate were investigated. The ablation property and corrosion resistance of Ta layer were analyzed. The results show that Ta layer is mainly composed of BCC α-Ta composition with the deposition layer depth of about 10μm and diffusion layer depth of about 3μm. The surface layer hardness is about 500HV0.2 and the bonding strength is about 65N. Under the same working condition, the corrosion resistance of Ta layer is better than that of matrix, which can prevent the formation of the embrittlement between C/N and matrix. With the increasing numbers of pulse ablation, the ablation area increases but the ablation depth maintains shallow. In the case of the high power pulse ablation, the Ta layer can decrease the melting and vaporization process, and improve the ablation resistance of the matrix.

Cite this article

WAN Yi,XIONG Dangsheng,LI Jianliang . Preparation of Glow Discharge Tantalum Coating and Its Ablation Properties[J]. Journal of Shanghai Jiaotong University, 2018 , 52(7) : 853 -859 . DOI: 10.16183/j.cnki.jsjtu.2018.07.014

References

[1]郑欣, 白润, 王东辉, 等. 航天航空用难熔金属材料的研究进展[J]. 稀有金属材料与工程, 2011, 40(10): 1871-1895. ZHENG Xin, BAI Run, WANG Donghui, et al. Research development of refractory metal materials used in the field of aerospace[J]. Rare Metal Materials and Engineering, 2011, 40(10): 1871-1895. [2]韩杰才, 胡平, 张幸红, 等. 超高温材料的研究进展[J]. 固体火箭技术, 2005, 28(4): 289-294. HAN Jiecai, HU Ping, ZHANG Xinghong, et al. Advances on ultra-high temperature materials[J]. Journal of Solid Rocket Technology, 2005, 28(4): 289-294. [3]杨秀丽, 王晓辉, 向仕彪, 等. 盐酸法富集钨渣中的钽和铌[J]. 中国有色金属学报, 2013, 23(3): 873-881. YANG Xiuli, WANG Xiaohui, XIANG Shibiao, et al. Enrichment of tantalum and niobium from tungsten residue by hydrochloric acid method[J]. The Chinese Journal of Nonferrous Metals, 2013, 23(3): 873-881. [4]陈朝轶, 鲁雄刚, 李重和, 等. 三相界面反应机制在SOM法制备金属钽中的应用[J]. 中国有色金属学报, 2009, 19(3): 583-588. CHEN Chaoyi, LU Xionggang, LI Chonghe, et al. Application of three-phase interline reaction mechanism on preparation of Ta metal using SOM process[J]. The Chinese Journal of Nonferrous Metals, 2009, 19(3): 583-588. [5]王升, 熊党生, 李建亮. 熔盐电镀钽及其耐磨损烧蚀性能[J]. 中国表面工程, 2015, 28(2): 101-107. WANG Sheng, XIONG Dangsheng, LI Jianliang. Wear and erosion resistance properties of electroplating Ta coating in molten salt[J]. China Surface Engineering, 2015, 28(2): 101-107. [6]MASSOT L, CHAMELOT P, PALAU P, et al. Electrocrystallisation of tantalum in molten fluoride media[J]. Electrochimica Acta, 2005, 50(27): 5408-5413. [7]NIKRAVES H M, AKBARI G H, POLADI A. A comprehensive study on the surface tribology of Ta thin film using molecular dynamics simulation: The effect of TaN interlayer, power and temperature[J]. Tribology International, 2017, 105: 185-192. [8]HALLMANNA L, ULMER P. Effect of sputtering parameters and substrate composition on the structure of tantalum thin films[J]. Applied Surface Science, 2013, 282: 1-6. [9]MATSON D W, MCCLANAHAN E D, RICE J P, et al. Effect of sputtering parameters on Ta coatings for gun bore applications[J]. Surface and Coatings Technology, 2000, 133: 411-416. [10]陈飞, 周海, 潘俊德. 钛合金表面辉光等离子渗钽的研究[J]. 材料热处理学报, 2009, 30(4): 156-159. CHEN Fei, ZHOU Hai, PAN Junde. Study on double-glow discharge plasma tantalizing on titanium alloy surface[J]. Transactions of Materials and Heat Treatment, 2009, 30(4): 156-159. [11]窦瑞芬, 田林海, 潘俊德, 等. 网状阴极法在碳钢表面沉积钽薄膜[J]. 中国有色金属学报, 2001, 11(S2): 203-206. DOU Ruifen, TIAN Linhai, PAN Junde, et al. Ta film synthesized in carbon steel substrate by net-shape cathode sputtering method[J]. The Chinese Journal of Nonferrous Metals, 2001, 11(S2): 203-206. [12]GERLICH L, OHSIEK S, KLEIN C, et al. Interface engineering for the TaN/Ta barrier film deposition process to control Ta-crystal growth[J]. Microelectronic Engineering, 2013, 106: 63-68. [13]PHAM V H, LEE S H, LI Y, et al. Utility of tantalum (Ta) coating to improve surface hardness in vitro bioactivity and biocompatibility of Co-Cr[J]. Thin Solid Films, 2013, 536: 269-274. [14]CHANG B, ALLEN C, BLACKBURN J, et al. Fluid flow characteristics and porosity behavior in full penetration laser welding of a titanium alloy[J]. Metallurgical and Materials Transactions B, 2015, 46(2): 906-918. [15]PARK K W, NA S J. Theoretical investigations on multiple-reflection and Rayleigh absorption emission scattering effects in laser drilling[J]. Applied Surface Science, 2010, 256(8): 2392-2399.
Options
Outlines

/