面向散热应用的碳化硅表面热丝化学气相沉积金刚石膜生长速率
李维汉, 乔煜, 疏达, 王新昶
Growth Rates of HFCVD Diamond Films on Silicon Carbide Substrates for Heat Dissipation Applications
LI Weihan, QIAO Yu, SHU Da, WANG Xinchang
上海交通大学学报
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2023, (8): 1078
-1085
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DOI: 10.16183/j.cnki.jsjtu.2022.043
