上海交通大学学报

上海交通大学学报（自然版）

• 无线电电子学、电信技术 • 上一篇    下一篇

倾斜旋转紫外曝光在微针制备上的应用

蒋宏民，朱军，曹莹，陈翔，陈迪
  

  1. （上海交通大学 微纳科学技术研究院， 微米纳米加工技术国防科技重点实验室，薄膜与微细技术教育部重点实验室， 上海 200030）
  • 收稿日期:2009-08-21 修回日期:1900-01-01 出版日期:2010-08-31 发布日期:2010-08-31

Application of Inclined and Rotating UV Lithography in Preparation of Microneedles

JIANG Hongmin,ZHU Jun,CAO Ying,CHEN Xiang,CHEN Di

  

  1. （Institute of Micro/Nano Science and Technology, National Key Laboratory of Nano/Micro Fabrication Technology， Key Laboratory for Thin Film and Microfabrication of the Ministry of Education, Shanghai Jiaotong University，Shanghai 200030, China）
  • Received:2009-08-21 Revised:1900-01-01 Online:2010-08-31 Published:2010-08-31

摘要： 采用倾斜旋转光刻的方法开展圆锥形异平面微针制备技术研究.通过改进实验室现有设备，以SU8光刻胶结构为模具，通过聚合物材料间的图形转移制备了PDMS异平面圆锥形实心微针的倾角为67°、高度为353 μm的微针阵列.该方法具有低成本多材料适用的制备优势.

关键词: 三维微加工, 异平面微针, 倾斜旋转紫外光刻

Abstract: By improving the existing equipment of our laboratory, the process of inclined and rotating UV lithography in the fabrication of conical outofplane microneedles was researched and conical outofplane microneedles of PDMS were produced through pattern transfer between polymer materials by the SU8 photoresist mold. This method has the advantages of low cost and wide material applicability. The microneedle with the inclination of 67 °and the height of 353 microns was made by this method.

中图分类号: