面向散热应用的碳化硅表面热丝化学气相沉积金刚石膜生长速率
Growth Rates of HFCVD Diamond Films on Silicon Carbide Substrates for Heat Dissipation Applications
面向散热应用的碳化硅表面热丝化学气相沉积金刚石膜生长速率 |
| 李维汉, 乔煜, 疏达, 王新昶 |
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Growth Rates of HFCVD Diamond Films on Silicon Carbide Substrates for Heat Dissipation Applications |
| LI Weihan, QIAO Yu, SHU Da, WANG Xinchang |
| 图9 不同反应压力下制备金刚石的生长速率 |
| Fig.9 Growth rates of diamond prepared at different reactive pressures |
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